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CVD deposited TA2O5 and HfO2 layers as pH-sensitive layers for ISFETs
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conference paper
CVD deposited TA2O5 and HfO2 layers as pH-sensitive layers for ISFETs
van der Wal, P. D.
•
Briand, D.
•
Mondin, G.
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2006
IMCS The 11th International Meeting on Chemical Sensors
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