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research article
Exploiting Substrate Stress To Modify Nanoscale SAM Patterns
We describe a simple method based on postadsorption substrate stress induction to modify and control nanoscale phase-separated patterns formed in self-assembled monolayers. We show using mesoscale computer simulations and experiments that this method helps quickly progress a kinetically arrested patchy pattern into the equilibrium striped pattern, which is otherwise difficult to access. This work also establishes the role of curvature in the formation of aligned stripes several molecules wide on spherical nanoparticles and nanocylinders.
Type
research article
Authors
Publication date
2009
Published in
Volume
131
Issue
45
Start page
16377
End page
16379
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
June 6, 2011
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