conference paper
Identification of amorphous silicon residues in a low power CMOS technology
Ajuria, S
•
Jakubczak, JF
1999
Proceedings of SPIE
A large variety of physical analysis techniques are used in the semiconductor industry to identify defects impacting yield or reliability. Identification of a defect often requires the combined use of several techniques to give a clear understanding of th
Type
conference paper
Author(s)
Acovic, A
Buffat, PA
Brander, P
Jacob, P
Jeandupeux, O
Marsico, V
Rosenfeld, D
Moser, J
Kohli, M
Fluckiger, R
Editors
Ajuria, S
•
Jakubczak, JF
Date Issued
1999
Publisher
Published in
Proceedings of SPIE
ISBN of the book
0-8194-3481-7
Volume
3884
Start page
256
End page
264
Editorial or Peer reviewed
REVIEWED
Written at
EPFL
EPFL units
| Event name | Event date |
1999 | |
Available on Infoscience
July 4, 2019
Use this identifier to reference this record