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  4. Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)
 
conference paper

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Rousseau, Ian  
•
Arribas, Irene Sanchez
•
Carlin, Jean-Francois  
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Gerace, D
•
Lozano, G
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2016
Photonic Crystal Materials And Devices Xii
Conference on Photonic Crystal Materials and Devices XII

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near lambda = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity and gain is supplied by a single InGaN/GaN quantum well. Using this platform, we [1] and others [2] previously demonstrated single-mu W lasing thresholds due to the high beta Q-product inherent to the nanobeam geometry (beta is spontaneous emission coupling fraction into desired mode). In this work, we improved the fraction of emission emitted into our microscope's light cone by combining a redesigned photonic crystal cavity (c.f. [3]) with a cross-grating coupler with period approximately twice the photonic crystal lattice constant [4]. The samples were fabricated in epitaxial III-nitride layers grown on (111) silicon substrates using metal organic vapor phase epitaxy. The photonic crystal and output couplers were patterned using a single electron beam lithography exposure and subsequently transferred to the underlying III-nitride layers using dry etching. The nanobeams were then suspended via vapor phase etching of silicon in XeF2 (Figure 1) [5]. Scanning electron microscopy cross-sections revealed high-aspect ratio (>5), sub-70 nanometer diameter holes with near-vertical sidewalls. Fabrication-induced geometry errors were characterized by processing scanning electron micrographs with custom critical dimension software (Figure 2). Using UV micro-photoluminescence spectroscopy at room temperature, we measured the nanobeams' emission intensity, far-field profile, and quality factor. By comparing more than ten nominally identical nanobeams for each geometry with finite-difference time-domain simulations taking into account the geometrical deviations measured during fabrication [8], we characterized the role of fabrication-induced imperfections. Finally, we explored the trade-off between the quality factor and collected signal via lithographic variations of the output coupler grating amplitude. Our results demonstrate the robustness of III-nitrides for short-wavelength photonic crystal applications, such as photonic integrated circuits, optoelectronics, and cavity quantum electrodynamics.

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Type
conference paper
DOI
10.1117/12.2230669
Web of Science ID

WOS:000382992800011

Author(s)
Rousseau, Ian  
•
Arribas, Irene Sanchez
•
Carlin, Jean-Francois  
•
Butte, Raphael  
•
Grandjean, Nicolas  
Editors
Gerace, D
•
Lozano, G
•
Monat, C
•
Romanov, Sg
Date Issued

2016

Publisher

Spie-Int Soc Optical Engineering

Publisher place

Bellingham

Published in
Photonic Crystal Materials And Devices Xii
ISBN of the book

978-1-5106-0130-7

Total of pages

2

Series title/Series vol.

Proceedings of SPIE

Volume

9885

Start page

98850K

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Event nameEvent placeEvent date
Conference on Photonic Crystal Materials and Devices XII

Brussels, BELGIUM

APR 05-07, 2016

Available on Infoscience
October 18, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/130024
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