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  4. Physical aspects of colossal dielectric constant material CaCu3Ti4O12 thin films
 
research article

Physical aspects of colossal dielectric constant material CaCu3Ti4O12 thin films

Deng, G.C.
•
He, Z.B.
•
Muralt, P.  
2009
Journal of Applied Physics

The underlying physical mechanism of the so-called colossal dielectric constant phenomenon in CaCu3Ti4O12 CCTO thin films were investigated by using semiconductor theories and methods. The semiconductivity of CCTO thin films originated from the acceptor defect at a level 90 meV higher than valence band. Two contact types, metal-semiconductor and metal-insulatorsemiconductor junctions, were observed and their barrier heights, and impurity concentrations were theoretically calculated. Accordingly, the Schottky barrier height of metal-semiconductor contact is about 0.8 eV, and the diffusion barrier height of metal-insulator-semiconductor contact is about 0.4–0.7 eV. The defect concentrations of both samples are quite similar, of the magnitude of 1019 cm−3, indicating an inherent feature of high defect concentration.

  • Details
  • Metrics
Type
research article
DOI
10.1063/1.3106639
Web of Science ID

WOS:000268064700129

Author(s)
Deng, G.C.
He, Z.B.
Muralt, P.  
Date Issued

2009

Published in
Journal of Applied Physics
Volume

105

Issue

8

Article Number

084106

Subjects

calcium compounds

•

ceramics

•

copper compounds

•

dielectric thin films

•

impurity states

•

MIS structures

•

permittivity

•

Schottky barriers

•

semiconductor-metal boundaries

•

valence bands

•

Copper-Titanate

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
June 25, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/40905
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