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  4. Interpretation of N 1s core-level shifts at nitrided Si(001)-SiO2 interfaces: A first-principles study
 
conference paper

Interpretation of N 1s core-level shifts at nitrided Si(001)-SiO2 interfaces: A first-principles study

Rignanese, G.M.
•
Pasquarello, Alfredo  orcid-logo
2001
International workshop on device technology : Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics

We use a first-principles approach to fully relax a variety of model structures of nitrided Si(001)-SiO2 interfaces and to compute the corresponding N 1s core-level shifts. We establish a relationship between the N atoms positions and bonding configurations and their 1s core-level shifts. Finally, we provide a scheme for the interpretation of experimental photoemission spectra in terms of the bonding environment of the N atoms.

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paperRignanese.pdf

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