For the fabrication of microdevices with line widths approaching 1 mm, a patterning methodol. was developed by the modification of an existing plasma etching process, which is suitable for any form and type of diamond. These microdevices were tested as active sensing elements for both environmental control and metrol. applications: voltammetric detection of Cl, detection of at. O for space and terrestrial applications, the measurement of UV light, and finally, conductive at. force microscopy (AFM), which is successfully performed today with microfabricated diamond tips. [on SciFinder (R)]