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research article

TaSiN nanocomposite thin films: Correlation between structure, chemical composition, and physical properties

Ramirez, G.
•
Oezer, D.  
•
Rivera, M.
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2014
Thin Solid Films

The structural and electronic properties of fcc-TaN/SiNx nanocomposite thin films deposited by reactive magnetron sputtering have been investigated as function of the N and Si contents. Our studies have been mainly focused on three different types of nanocomposite TaxSiyNz films based on: nitrogen deficient fcc-TaN0.88, nearly stoichiometric fcc-TaN, and over-stoichiometric fcc-TaN1.2 with the Si contents in the range from 0 to about 15 at.%. The optical properties were investigated by ellipsometric measurements, while the DC. electrical resistivity was measured using the van der Pauw configuration at 300 K. The optical measurements were interpreted using the standard Drude-Lorentz model. The results showed that the electronic properties are closely correlated with both the compositional and the structural modifications of the TaxSiyNz films induced by the addition of Si atoms, and also depending on the stoichiometry of the starting fcc-TaN system. Thus, depending on both the nitrogen and the silicon contents, the fcc-TaxSiyNz films can exhibit room temperature resistivity values ranging from 10(2) mu Omega cm to about 6 x 10(4) mu Omega cm. Published by Elsevier B.V.

  • Details
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Type
research article
DOI
10.1016/j.tsf.2014.02.079
Web of Science ID

WOS:000334314100015

Author(s)
Ramirez, G.
•
Oezer, D.  
•
Rivera, M.
•
Rodil, S. E.
•
Sanjines, R.  
Date Issued

2014

Publisher

Elsevier Science Sa

Published in
Thin Solid Films
Volume

558

Start page

104

End page

111

Subjects

Tantalum nitride

•

Silicon nitride

•

Thin films

•

Optical properties

•

Electrical properties

•

Nanocomposites

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPMC  
Available on Infoscience
May 26, 2014
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/103618
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