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research article

Laser-Initiated Metal-Deposition on Gaas Substrates

Rytz-Froidevaux, Y.
•
Salathe, R. P.
•
Gilgen, H. H.
1981
Physics Letters A

The local deposition of metal structures by thermal dissociation of trimethylaluminium, dimethylzinc and dimethylcadmium on GaAs surfaces heated by a CW krypton laser has been investigated. Piles of amorphous aluminium and zinc and crystalline structures of Cd have been deposited at temperatures between 200 and 1200°C. The smallest size of the deposits was ≈4 μm

  • Details
  • Metrics
Type
research article
DOI
10.1016/0375-9601(81)90761-1
Author(s)
Rytz-Froidevaux, Y.
Salathe, R. P.
Gilgen, H. H.
Date Issued

1981

Published in
Physics Letters A
Volume

84

Issue

4

Start page

216

End page

218

Subjects

aluminium

•

cadmium

•

chemical vapour deposition

•

gallium arsenide

•

III-V semiconductors

•

laser beam applications

•

metallisation

•

substrates

•

zinc

Note

Inst. of Appl. Phys., Univ. of Berne, Berne, Switzerland Copyright 1981, IEE 1757166 0375-9601 GaAs substrates thermal dissociation trimethylaluminium dimethylzinc dimethylcadmium amorphous crystalline structures Cd laser initiated metal deposition Al Zn CVD

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

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Available on Infoscience
January 20, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/33946
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