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  4. Strong carrier localization in GaInN/GaN quantum dots grown by molecular beam epitaxy
 
research article

Strong carrier localization in GaInN/GaN quantum dots grown by molecular beam epitaxy

Damilano, B.
•
Vezian, S.
•
Grandjean, N.  
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1999
Japanese Journal of Applied Physics Part 2-Letters

GaInN/GaN quantum dots (QDs) are grown by molecular beam epitaxy making use of the Stranski-Krastanov growth regime. III Situ scanning tunneling microscopy (STM) evidences the formation of three-dimensional GaInN islands. An island density as high as 10(12) cm(-2)? is deduced from STM images. It is shown that the room-temperature photoluminescence (PL) of GaInN/GaN QDs can be tuned from 3 eV to 2.5 eV by increasing the GaInN thickness from 10 to 30 A. Photothermal deflection spectroscopy is carried out to measure the absorption of GaInN/GaN QDs. For dots emitting at 2.63 eV, a Stokes shift of 250 meV is found between the maximum PL energy and the absorption edge indicating very strong carrier localization.

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Type
research article
DOI
10.1143/JJAP.38.L1357
Author(s)
Damilano, B.
Vezian, S.
Grandjean, N.  
Massies, J.
Date Issued

1999

Published in
Japanese Journal of Applied Physics Part 2-Letters
Volume

38

Issue

12A

Start page

L1357

End page

L1359

Subjects

GaInN

•

quantum dots

•

photoluminescence

•

localization

•

STM

•

MBE

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/54868
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