Loading...
conference paper
Novel apparatus for the uniform heating of substrates during post-expose bake
2003
Advances in Resist Technology and Processing XX
Type
conference paper
Authors
Publication date
2003
Published in
Advances in Resist Technology and Processing XX
Series title/Series vol.
Proceedings of SPIE-The International Society for Optical Engineering; 5039
Volume
2
Start page
1319
End page
1326
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
February 21, 2006
Use this identifier to reference this record