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research article

The implementation of thermal and UV nanoimprint lithography for selective area epitaxy

Hager, Antonia
•
Gueniat, Lucas
•
Morgan, Nicholas  
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October 30, 2023
Nanotechnology

Semiconductor nanowires (NWs) in horizontal configuration could provide a path for scalable NW-based devices. Bottom-up large-scale manufacturing of these nanostructures by selective area epitaxy (SAE) relies on precise nanopatterning of various shapes on the growth masks. Electron beam lithography offers an extraordinary accuracy suited for the purpose. However, this technique is not economically viable for large production as it has a low throughput and requires high investment and operational costs. Nanoimprint lithography (NIL) has the potential to reduce fabrication time and costs significantly while requiring less sophisticated equipment. In this work, we utilize both thermal and UV NIL for patterning substrates for SAE, elucidating the advantages and disadvantages of each lithography technique. We demonstrate the epitaxial growth of Ge and GaAs NWs on these substrates, where we observe high-quality mono-crystalline structures. Even though both processes can produce small uniform structures suitable for SAE, our results show that UV NIL proves to be superior and enables reliable and efficient patterning of sub-100 nm mask features at the wafer scale.

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Type
research article
DOI
10.1088/1361-6528/acea87
Web of Science ID

WOS:001048911000001

Author(s)
Hager, Antonia
•
Gueniat, Lucas
•
Morgan, Nicholas  
•
Ramanandan, Santhanu Panikar  
•
Rudra, Alok  
•
Piazza, Valerio  
•
Fontcuberta i Morral, Anna  
•
Dede, Didem  
Date Issued

2023-10-30

Published in
Nanotechnology
Volume

34

Issue

44

Article Number

445301

Subjects

Nanoscience & Nanotechnology

•

Materials Science, Multidisciplinary

•

Physics, Applied

•

Science & Technology - Other Topics

•

Materials Science

•

Physics

•

nanoimprint lithography

•

horizontal nanowires

•

selective area epitaxy

•

movpe

•

thermal nil

•

uv nil

•

fabrication

•

imprint

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LMSC  
Available on Infoscience
August 28, 2023
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/200089
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