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  4. Thresholdless Lasing of Nitride Nanobeam Cavities on Silicon
 
conference paper

Thresholdless Lasing of Nitride Nanobeam Cavities on Silicon

Jagsch, Stefan Thomas
•
Trivino, Noelia Vico  
•
Callsen, Gordon  
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2016
2016 International Semiconductor Laser Conference (Islc)
25th International Semiconductor Laser Conference (ISLC)

We present a temperature dependent optical and quantum-optical characterization of close-to-ideal lasing in GaN-based nanobeam cavities. Measuring the photon statistics of emission allows us to prove high-beta lasing at room temperature, and thresholdless lasing at 156K. Thresholdless lasing is explained via temperature dependent carrier redistribution in the 0D/2D gain medium.

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Type
conference paper
Web of Science ID

WOS:000392249800024

Author(s)
Jagsch, Stefan Thomas
•
Trivino, Noelia Vico  
•
Callsen, Gordon  
•
Kalinowski, Stefan
•
Rousseau, Ian Michael  
•
Carlin, Jean-Francois  
•
Butte, Raphael  
•
Hoffmann, Axel
•
Grandjean, Nicolas  
•
Reitzenstein, Stephan
Date Issued

2016

Publisher

Ieee

Publisher place

New York

Published in
2016 International Semiconductor Laser Conference (Islc)
ISBN of the book

978-4-8855-2306-9

Total of pages

2

Series title/Series vol.

IEEE International Semiconductor Laser Conference

Subjects

High-beta lasing

•

Photon Statistics

•

Nanobeam

•

Nitride on Silicon

Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LASPE  
Event nameEvent placeEvent date
25th International Semiconductor Laser Conference (ISLC)

Kobe, JAPAN

SEP 12-15, 2016

Available on Infoscience
February 17, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/134376
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