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patent

Semiconductor based high resistance

Brauer, Elisabeth
•
Leblebici, Yusuf
2008

The field of invention is in the area of MOS integrated circuits operating with very low currents in the weak inversion region or sub threshold. The method aims at providing linear resistor with a value in the multi-mega ohm range. In order to produce Silicon based high resistance value, the claimed invention provides a semiconductor resistance using MOS transistor comprising a gate, drain, source and body terminals wherein the body terminal is tied to the drain terminal, the voltage applied between the source and the gate defining the resistance value.

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Type
patent
EPO Family ID

38293112

Author(s)
Brauer, Elisabeth
Leblebici, Yusuf
Note

Alternative title(s) : (de) Halbleiterbasierter hoher widerstand (fr) Haute résistance à semi-conducteur

TTO classification

TTO:6.0682

EPFL units
AVP-R-TTO  
DOICountry codeKind codeDate issued

EP1976021

EP

A1

2008-10-01

Available on Infoscience
June 13, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/138328
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