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patent

Heated mask

Xie, Shenqi  
•
Savu, Andreea
•
Brugger, Juergen  
2013

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remove clogging and control the resolution of the deposited material by deforming the membrane towards or away from a substrate.

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Type
patent
EPO Family ID

46508121

Author(s)
Xie, Shenqi  
•
Savu, Andreea
•
Brugger, Juergen  
Note

Alternative title(s) : (fr) Lithographie à stencil dynamique auto-nettoyante in situ à base de micro-élément chauffant (en) Microheater-based in situ self-cleaning dynamic stencil lithography

TTO classification

TTO:6.1074

EPFL units
LMIS1  
TTO  
DOICountry codeKind codeDate issued

WO2012164546

WO

A3

2013-01-24

WO2012164546

WO

A2

2012-12-06

Available on Infoscience
September 22, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/118531
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