The invention relates to a method for manufacturing an electrode, preferably an implantable electrode array comprising the following steps: Applying (101) a layer of electrically conducting material (4) above a substrate material (1) for forming the electrically conductive traces; applying (102) a layer of insulating material (6) directly on top of the layer of electrically conducting material (4) for covering the electrically conductive traces; patterning (103) the layer of insulating material (4) by partly exposing the layer of electrically conducting material (4) to form at least one contact area (8) on the layer of the electrically conducting material (4), wherein a mask for patterning the layer of insulating material (6) defines a region (9) in the at least one contact area (8) at which the insulating material (6) in the at least one contact area (8) remains; and partly applying (104) a top layer (13) of electrically conducting material (4) at the contact area (8) on top of the layer of insulating material (6) for coating the remaining insulating material (9) to lift the contact area (8a). The invention further relates to an electrode, preferably an implantable electrode array.