patent
Lithographic patterning of insulating or semiconducting solid state material in crystalline form
2014
A method for lithographic patterning of an insulating or semiconducting solid state material in crystalline form, said method comprising a step where said material is exposed to an amount of radiation which is sufficient to change its insulating or semiconducting state into a conducting state.
Type
patent
EPO Family ID
50000030
Author(s)
TTO classification
TTO:6.1204
EPFL units
| DOI | Country code | Kind code | Date issued |
US2015323864 | US | A1 | 2015-11-12 |
WO2014080367 | WO | A1 | 2014-05-30 |
Available on Infoscience
May 24, 2017
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