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patent

Gas pressure measurement device

Rousseau, Ian  
•
Sohi, Pirouz  
2019

The present invention concerns vacuum pressure gauge or gas pressure measurement device comprising a polar semiconductor structure, at least one light source for illuminating a surface of the polar semiconductor structure, measurement means configured to measure a value representing a gas adsorption rate or a change in gas adsorption rate on the surface of the polar semiconductor structure, comparison means configured to compare said measured value with at least one predetermined setpoint value representing a balance between photoinduced desorption and gas adsorption on the surface of the polar semiconductor structure and control means configured to change an optical output power of the light source to match or substantially match said measured value with said setpoint value.

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Type
patent
EPO Family ID

66794050

Author(s)
Rousseau, Ian  
Sohi, Pirouz  
Note

Alternative title(s) : (fr) Dispositif de mesure de pression de gaz

TTO classification

TTO:6.1837

EPFL units
AVP-R-TTO  
LASPE  
DOICountry codeKind codeDate issued

US2021231512

US

A1

2021-07-29

EP3791170

EP

A1

2021-03-17

WO2019215610

WO

A1

2019-11-14

Available on Infoscience
December 5, 2019
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/163636
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