Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
2011
Abstract
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Details
Title
Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
Author(s)
Dabirian, Ali ; Kuzminykh, Yury ; Wagner, Estelle ; Benvenuti, Giacomo ; Rushworth, Simon A. ; Hoffmann, Patrik
Published in
Chemphyschem
Volume
12
Pages
3524-3528
Date
2011
Keywords
Other identifier(s)
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Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LPMAT - Laboratory for Photonic Materials and Characterization
Scientific production and competences > STI - School of Engineering > STI Archives > LOA - Advanced Photonics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > STI - School of Engineering > STI Archives > LOA - Advanced Photonics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2012-06-25