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  4. Evaluation of AllnN/GaN HEMTs on sapphire substrate in microwave, time and temperature domains
 
research article

Evaluation of AllnN/GaN HEMTs on sapphire substrate in microwave, time and temperature domains

Medjdoub, F.
•
Ducatteau, D.
•
Gaquiere, C.
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2007
Electronics Letters

AllnN/GaN high electron mobility transistors (HEMTs) on sapphire substrate have yielded a maximum drain current density of 1.26 A/mm with a current gain cutoff and maximum oscillation frequencies about 26 and 40 GHz, respectively, for a 0.25 mu m gate length device. Pulsed characterisations indicate absence of the virtual gate effect and reveal that the drain current dispersion is mainly due to thermal effects. Temperature stress experiments up to 800 degrees C indicate that surface and hetero-interface are inherently stable. The reasons for the behaviour are discussed.

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Type
research article
DOI
10.1049/el:20073170
Web of Science ID

WOS:000245683200036

Author(s)
Medjdoub, F.
Ducatteau, D.
Gaquiere, C.
Carlin, J. E.  
Gonschorek, M.
Feltin, E.
Py, M. A.
Grandjean, N.  
Kohn, E.
Date Issued

2007

Published in
Electronics Letters
Volume

43

Issue

5

Start page

309

End page

311

Subjects

INALN/(IN)GAN

•

HFETS

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55100
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