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Journal article
Micromachined chip-scale plasma light source
We report on the microfabrication and testing of a chip- scale plasma light source. The device consists of a stack of three anodically bonded Pyrex wafers, which hermetically enclose a gas-filled cavity containing interdigitated Aluminum electrodes. When the electrodes are powered through an impedance matching circuit, these devices have been used to generate stable millimeter- size RF plasma discharges operating continuously for over 24 hours in He or Ar at pressures ranging from 10 to 500 mbar at RF powers of 300 to 1500 mW.
Keywords: plasma source ; micromachining ; anodic bonding ; hermetic ; Pyrex ; powder blasting
Reference
- LMTS-ARTICLE-2008-004
- doi:10.1016/j.sna.2008.05.028
- View record in Web of Science
Record created on 2008-06-22, modified on 2012-03-28